IVAM Microtechnology Network
Booth no. B20
SENTECH has been offering systems for plasma process technology (reactive ion etching, plasma-enhanced chemical vapor deposition, atomic layer deposition) and thin-film measurement technology (ellipsometry, reflectometry) for over thirty years. We focus on quality, flexibility and the ability to automate the systems. Applications are the etching of micro and nano structures as well as the production and measurement of thin layers. Our users are well-known research institutes, the semiconductor industry, optics, MEMS, sensor technology and others.SENTECH sells equipment for plasma process technology (etching/coating equipment, ALD, ALE) and measuring equipment for optical thin film metrology (ellipsometers and reflectometers)
Plasma Process Technology:
ICP etching system for low damage etching, RIE etching system, ICPECVD system for low damage coating, ALD and ALE systems. All equipment can be integrated into one cluster.
Optical thin film metrology:
SENresearch 4.0 with wide spectral range from 190 - 3,500 nm, SENDIRA MIR spectroscopic ellipsometer, SENDURO MEMS an automated measurement platform, laser ellipsometer and others.
